发明名称 Method for manufacturing a integrated circuit
摘要 A method for manufacturing an integrated circuit is provided to minimize a modification cost according to a change of a design of logic after an IC manufacturing process is performed. An integrated circuit includes a plurality of logic devices. A logic forming process is performed to form residual logic which is not connected with the plurality of logic devices. One or more via-holes or one or more deposition material layers are formed on the residual logic device when a logic device is formed on the residual logic. A pin is formed on a deposition material layer of a top surface of the residual logic device.
申请公布号 KR100698257(B1) 申请公布日期 2007.03.22
申请号 KR20050114302 申请日期 2005.11.28
申请人 发明人
分类号 H01L27/04 主分类号 H01L27/04
代理机构 代理人
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