发明名称 |
SPECIMEN INSPECTION DEVICE, IMAGE ALIGNMENT METHOD, AND PROGRAM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and device for highly accurately aligning a reference image with an optical image. <P>SOLUTION: This specimen inspection device 100 is characterized by being equipped with: a sub-pixel basis SSD calculation circuit 320 for calculating the amount of displacement from a provisional alignment position of an optical image of a photomask 101 with a reference image to a position where the sum of squares of residuals is minimized; a least-squares method displacement calculation circuit 322 for calculating the amount of displacement from the provisional alignment position owing to the least-squares method; a residual square sum calculation circuit 324 for calculating the sum of squares of residuals at a position to which displacement is made by the amount of displacement calculated by the calculation circuit 322; a determination circuit 340 for determining which is smaller of the minimum sum of squares of residuals obtained by the calculation circuit 320 and the sum of squares of residuals obtained by the calculation circuit 324; and a position correction circuit 350 for correcting an alignment position to a position where the smaller sum of squares of residuals is obtained. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007071630(A) |
申请公布日期 |
2007.03.22 |
申请号 |
JP20050257606 |
申请日期 |
2005.09.06 |
申请人 |
ADVANCED MASK INSPECTION TECHNOLOGY KK |
发明人 |
YAMASHITA KYOJI |
分类号 |
G01N21/956;G03F1/84;H01L21/027 |
主分类号 |
G01N21/956 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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