OPTICAL METROLOGY OPTIMIZATION FOR REPETITIVE STRUCTURES
摘要
<p>The top-view profiles of repeating structures in a wafer are characterized and parameters to represent variations in the top- view profile of the repeating structures are selected. An optical metrology model is developed that includes the selected top-view profile parameters of the repeating structures. The optimized optical metrology model is used to generate simulated diffraction signals that are compared to measured diffraction signals.</p>
申请公布号
WO2006091361(A3)
申请公布日期
2007.03.22
申请号
WO2006US04151
申请日期
2006.02.06
申请人
TOKYO ELECTRON LIMITED;VOUNG, VI;BAO, JUNWEI;BISCHOFF, JOERG