发明名称 EXPANDING METHOD AND EXPANDING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a wafer expanding method which improves a yield without depositing a contaminant on the wafer surface and an expanding apparatus. SOLUTION: The expanding method includes a process of enlarging an interval between each chips T by expanding an adhesive sheet S applied on the back of the wafer W after a dicing work. The interval between each chips T is enlarged by expanding the adhesive sheet S after reversing the surface of the wafer W after being diced in the gravity direction. Consequently, the contaminant is prevented from depositing on the wafer W, and the wafer W expansion can be obtained with improved yield. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007067278(A) 申请公布日期 2007.03.15
申请号 JP20050253637 申请日期 2005.09.01
申请人 TOKYO SEIMITSU CO LTD 发明人 TAMAOKI TOMOHIRO;KUJIME NORITAKA
分类号 H01L21/301 主分类号 H01L21/301
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