| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas cluster ion beam apparatus which can easily prevent abnormal discharge between a skimmer and an ionization device. SOLUTION: The gas cluster ion beam apparatus comprises: a cluster generation chamber 2 for generating gas clusters by introducing a gas from a nozzle 1; and a process chamber 15 which is separated from the cluster generation chamber 2 by a partition wall 18, and in which the gas clusters are supplied through the skimmer 4 installed on the partition wall 18. The process chamber 15 is provided with the ionization device 5 for ionizing the gas clusters introduced in the process chamber 15, and electrodes 7 for making the gas clusters irradiate a substrate 8 to be processed by accelerating the gas clusters ionized with the ionization device 5. A nozzle 1 and the skimmer 4 are made at ground potential, and the potential difference between the skimmer 4 and the ionization device 5 is made lower than the irradiation energy of the cluster ions to the substrate 8. COPYRIGHT: (C)2007,JPO&INPIT
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