发明名称 Method of determining an illumination profile and device manufacturing method
摘要 An illumination profile useable in a lithographic apparatus to match the output of a target lithographic apparatus is obtained by obtaining a reference CD vs. pitch function for the lithographic projection apparatus at at least a plurality of pitch values using a reference illumination profile; obtaining a target CD vs. pitch function at at least the plurality of pitch values; generating a CD sensitivity map for the lithographic projection apparatus for a given pattern; calculating from the reference CD vs. pitch function, the target CD vs. pitch function and the CD sensitivity map, a suitable illumination profile to be used in said lithographic apparatus to expose said given pattern.
申请公布号 US2007059614(A1) 申请公布日期 2007.03.15
申请号 US20050223154 申请日期 2005.09.12
申请人 ASML NETHERLANDS B.V. 发明人 FINDERS JOZEF M.;KOOLEN ARMAND EUGENE A.
分类号 G03C5/00 主分类号 G03C5/00
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