| 摘要 |
A chemical vapor deposition apparatus having heater blocks is provided to reduce work time required to remove defects by using a movable lid attached to a cover of the heater blocks. A turntable(210) rotates on a shaft. Plural heater blocks(220) are arranged on a side of the turntable. Each heater block has a heater(221) fixed on the turntable, a cover(222), and a movable lid(223). The cover is fixed on the heater and has an opening unit. The movable lid opens and shuts the cover. Plural susceptors(230) are arranged on another side of the turntable. A wafer is mounted on the susceptor. A head(250) is arranged from the susceptor in a certain interval to provide a process gas to the wafer.
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