发明名称 METHOD OF FABRICATING DIELECTRIC FILM, AND CAPACITOR
摘要 PROBLEM TO BE SOLVED: To provide a capacitor provided with a dielectric film capable of exhibiting a sufficiently high dielectric constant and to provide a method of fabricating a dielectric film capable of producing a dielectric film while sufficiently suppressing oxidization of a metal layer to cause a sufficiently high dielectric constant to come out. SOLUTION: The capacitor 100 has a dielectric film 1 and a first electrode 2 and a second electrode 3 provided oppositely while sandwiching the dielectric film 1, wherein the dielectric film 1 has a density in excess of 72% of a theoretical density calculated on the basis of a lattice constant, and at least one of the first electrode 2 and the second electrode 3 contains at least one metal selected from the group consisting of Cu, Ni, Al, stainless steel and Inconel (trade mark). COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007059896(A) 申请公布日期 2007.03.08
申请号 JP20060204910 申请日期 2006.07.27
申请人 TDK CORP 发明人 UCHIDA KIYOSHI;HORINO KENJI;SAIDA HITOSHI
分类号 H01G4/33 主分类号 H01G4/33
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