发明名称 METHOD AND APPARATUS FOR ORDINARY-PRESSURE PLASMA TREATMENT
摘要 PROBLEM TO BE SOLVED: To ensure the treating capacity of ordinary-pressure plasma treatment by always preventing entrainment of the external atmosphere into the treating passage, independently of the relative moving direction of the treating unit. SOLUTION: A plasma discharge of a nearly atmospheric pressure is formed in the treating passage 16 between the treating unit 11 and the base W of the plasma treatment unit M to carry out plasma surface treatment of the base W. When the treating unit 11 moves relatively in the going direction, a process gas is introduced into the treating passage 16 from the end of the treating passage 16 in the going direction. When the treating unit 11 moves relatively in the coming direction, the process gas is introduced into the treating passage 16 from the end of the treating passage 16 in the coming direction. The arrangement switches the direction of the flow of the process gas in the treating passage 16 according to the relative moving direction of the treating unit 11. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007054697(A) 申请公布日期 2007.03.08
申请号 JP20050240543 申请日期 2005.08.23
申请人 SEKISUI CHEM CO LTD 发明人 TAKEUCHI TOSHIKIMI;NAKAJIMA SETSUO
分类号 B08B7/00;H01L21/304 主分类号 B08B7/00
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