| 摘要 |
<p>A composition for reduction of turmeric and iodine complex stains comprising at least one stain resist agent and at least one stain resist enhancer, said enhancer comprising at least one of an alkali metal salt; alkali metal aryl salt; aryl sulfonic acid; urea; alkyl carbamate; and amide, alkylamide, dialkylamide, or cyclic amide of formic acid, of C<SUB>1</SUB> to C<SUB>6</SUB> alkanoic acids, or of C<SUB>1</SUB> to C<SUB>6</SUB> alkandioic acids is disclosed.</p> |
| 申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY;MATERNIAK, JOYCE, MONSON;FITZGERALD, PATRICK, HENRY;LANGLEY, MELEA, RENA;MURPHY, PETER, MICHAEL;SELF, AARON, FRANK |
发明人 |
MATERNIAK, JOYCE, MONSON;FITZGERALD, PATRICK, HENRY;LANGLEY, MELEA, RENA;MURPHY, PETER, MICHAEL;SELF, AARON, FRANK |
