发明名称 |
SYSTEM AND METHOD FOR CARRYING OUT LIQUID AND SUBSEQUENT DRYING TREATMENTS ON ONE OR MORE WAFERS |
摘要 |
<p>Systems for processing microelectronic substrates in a process chamber that incorporate improved technology for transitioning from a wet process to a dry process (especially transitioning from rinsing to drying). At least a portion of residual liquid remaining in fluid supply lines after a wet treatment is removed via a pathway that avoids purging directly onto the substrates. Related methods are also included in the present invention.</p> |
申请公布号 |
EP1758689(A2) |
申请公布日期 |
2007.03.07 |
申请号 |
EP20050754379 |
申请日期 |
2005.05.25 |
申请人 |
FSI INTERNATIONAL, INC. |
发明人 |
BENSON, ARNE, C.;OLSON, ERIK, D.;SPAETH, DOUGLAS, S. |
分类号 |
B08B3/02;H01L21/00;H01L21/306 |
主分类号 |
B08B3/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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