发明名称 |
THIN FILM TRANSISTOR AND METHOD FOR FABRICATING THE SAME |
摘要 |
<p>A TFT is provided to reduce kink effect and drain current caused by an LEF(lateral electric field) formed in a drain region by connecting a channel layer to a source region in a semiconductor layer. A gate electrode(202) is disposed on a substrate. A gate insulation layer is positioned on the gate electrode. A semiconductor layer is positioned on the gate insulation layer, including a channel region(204C) and a source/drain region. An interconnection part(207) is positioned on the channel region of the semiconductor layer. A source electrode(208S) is positioned on the source region of the semiconductor layer, electrically connected to the interconnection part. A drain electrode(208D) is positioned on the drain region of the semiconductor layer. A high-doped silicon layer is positioned between the source/drain region and the source/drain electrode of the semiconductor layer.</p> |
申请公布号 |
KR20070024220(A) |
申请公布日期 |
2007.03.02 |
申请号 |
KR20050078921 |
申请日期 |
2005.08.26 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
PARK, BYOUNG KEON;CHOI, BYOUNG DEOG;SO, MYEONG SEOB |
分类号 |
H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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