发明名称 |
ILLUMINATION OPTICAL DEVICE, EXPOSURE SYSTEM, EXPOSURE METHOD, AND METHOD OF MANUFACTURING MICRO DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To form a circumferentially-polarized orbicular-zone-shaped illumination pupil distribution while favorably reducing light quantity loss by using a polarization conversion element that can convert linearly polarized incident light having a polarization direction in an almost single direction into circumferentially-polarized light having a polarization direction in an almost circumferential direction. <P>SOLUTION: An illumination optical device of the present invention comprises: a light source (1) that supplies illumination light; and a polarization conversion element (10) that is positioned in an optical path between the light source and illuminated surfaces (M, W) and converts the polarization state of incident light into a predetermined polarization state. The polarization conversion element is made of an optical material having optical rotation, has a thickness distribution changing in a circumferential direction, and is configured to be insertable/removable into/from the illumination optical path. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2007053390(A) |
申请公布日期 |
2007.03.01 |
申请号 |
JP20060262590 |
申请日期 |
2006.09.27 |
申请人 |
NIKON CORP |
发明人 |
TANITSU OSAMU;SHIGEMATSU KOJI;HIROTA HIROYUKI;MATSUYAMA TOMOYUKI |
分类号 |
H01L21/027;G02B5/18;G02B5/30;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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