发明名称 ILLUMINATION OPTICAL DEVICE, EXPOSURE SYSTEM, EXPOSURE METHOD, AND METHOD OF MANUFACTURING MICRO DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To form a circumferentially-polarized orbicular-zone-shaped illumination pupil distribution while favorably reducing light quantity loss by using a polarization conversion element that can convert linearly polarized incident light having a polarization direction in an almost single direction into circumferentially-polarized light having a polarization direction in an almost circumferential direction. <P>SOLUTION: An illumination optical device of the present invention comprises: a light source (1) that supplies illumination light; and a polarization conversion element (10) that is positioned in an optical path between the light source and illuminated surfaces (M, W) and converts the polarization state of incident light into a predetermined polarization state. The polarization conversion element is made of an optical material having optical rotation, has a thickness distribution changing in a circumferential direction, and is configured to be insertable/removable into/from the illumination optical path. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007053390(A) 申请公布日期 2007.03.01
申请号 JP20060262590 申请日期 2006.09.27
申请人 NIKON CORP 发明人 TANITSU OSAMU;SHIGEMATSU KOJI;HIROTA HIROYUKI;MATSUYAMA TOMOYUKI
分类号 H01L21/027;G02B5/18;G02B5/30;G03F7/20 主分类号 H01L21/027
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