| 摘要 |
<P>PROBLEM TO BE SOLVED: To facilitate double-face alignment with high accuracy and high reproducibility. <P>SOLUTION: A lens substrate 16 and an L-shaped spacer 18 are disposed in a retaining hole 10 of a substrate holder 10, and the substrate 16 is pushed to a corner part LC and fixed with fixing screws 12a to 12d through the spacer 18. Positioning marks such as 14A are formed on both top and back surfaces of the holder 10; and the holder 10, the substrate 16 and the spacer 18 are in the same level on both surfaces of the holder 10. After a resist layer is formed on both surfaces of the holder 10, the resist layer on the top surface is exposed to transfer a lens array formation pattern while a photomask for the top surface is aligned using the positioning marks on the top surface. The resist layer on the back surface is exposed to transfer a lens array formation pattern while a photomask for the back surface is aligned using the positioning marks on the back surface. <P>COPYRIGHT: (C)2007,JPO&INPIT |
