| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for printing a composite pattern on a large substrate the area of which is larger than that of a mask in a short time. <P>SOLUTION: The method includes: arranging a hologram mask on a first face of a coupling element; arranging the substrate substantially parallel and in proximity to the hologram mask and such that the substrate is laterally positioned with respect to the pattern recorded in the hologram mask; printing the pattern in focus into a part of a photosensitive layer by scanning an exposure beam over the hologram mask and reconstructing the pattern recorded therein while simultaneously measuring the local separation of the substrate and the hologram mask where reconstruction is taking place by scanning a focus beam over the hologram mask and continuously correcting the separation by displacing the hologram mask and the coupling element; and repeating the arranging and printing steps to print again the pattern into an unexposed part of the photosensitive layer. <P>COPYRIGHT: (C)2007,JPO&INPIT |
