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发明名称
AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, KIT FOR PREPARING THE AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING PROCESS, AND PROCESS FOR PRODUCING SEMICONDUCTOR DE?CES
摘要
申请公布号
KR20070023602(A)
申请公布日期
2007.02.28
申请号
KR20060080577
申请日期
2006.08.24
申请人
发明人
分类号
C09K3/14
主分类号
C09K3/14
代理机构
代理人
主权项
地址
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