| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition apparatus capable of depositing a thin film of excellent quality in the atmosphere. SOLUTION: In the film deposition method and the film deposition apparatus, aerosol is generated by atomizing a metal compound as a raw material by the ultrasonic vibration in a carrier gas, and the aerosol is heated and sprayed on a work to obtain a uniform film of excellent quality. According to the film deposition method and the film deposition apparatus, the film can be deposited in the atmosphere, and the film deposition can be performed in an open space without providing any film deposition chamber or the like. Thus, the line arrangement of manufacturing equipment is facilitated, and the manufacturing efficiency can be enhanced. COPYRIGHT: (C)2007,JPO&INPIT
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