| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition apparatus which can search the optimum film deposition condition by a combinatorial film deposition, and can easily perform a depositision on the whole face of a substrate under the optimum film deposition condition. SOLUTION: (a) The positional relation between the region of a substrate 1' to be deposited with a film having desired characteristics and a target held to target holding parts 6, 7 is searched by combinatorial film deposition. (b) A mask 4 is arranged on the surface of the substrate 1; wherein, an opening 5 for selecting the film deposition region in the surface of the substrate 1 is formed in the mask 5, and the mask 4 is located in such a manner that the opening 5 corresponds to the region in the surface of the substrate to be deposited with the film having desired characteristics in the positional relation searched by the combinatorial film deposition. (c) The substrate 1 is parallelly translated in an X-Y plane, and the arrangement of the substrate 1 to the opening 5 of the mask is changed, thus film deposition in which the positional relation searched by the combinatorial film deposition is held is performed to the whole of the required region in the surface of the substrate 1. COPYRIGHT: (C)2007,JPO&INPIT
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