UNSYMMETRICAL LIGAND SOURCES, REDUCED SYMMETRY METAL-CONTAINING COMPOUNDS, AND SYSTEMS AND METHODS INCLUDING SAME

摘要

The present invention provides metal-containing compounds that include at least one ß-diketiminate ligand, and methods of making and using the same. In some embodiments, the metal-containing compounds are homoleptic complexes that include unsymmetrical ß-diketiminate ligands. In other embodiments, the metal-containing compounds are heteroleptic complexes including at least one ß-diketiminate ligand. The compounds can be used to deposit metal-containing layers using vapor deposition methods. Vapor deposition systems including the compounds are also provided. Sources for ß-diketiminate ligands are also provided.