<p>Compositions and methods useful for the removal of polymeric material from substrates, such as electronic devices are provided. These compositions and methods are particularly suitable for removing polymer residues from electronic devices following plasma etch processes.</p>
申请公布号
EP1755003(A1)
申请公布日期
2007.02.21
申请号
EP20060253892
申请日期
2006.07.25
申请人
ROHM AND HAAS ELECTRONIC MATERIALS LLC
发明人
BRAINARD, ROBERT L.;AUGER, ROBERT L.;LACHOWSKI, JOSEPH F.