发明名称 |
Immersion optical projection system |
摘要 |
An immersion optical projection system for photolithography is provided. A transparent plate is located between a last lens element and the wafer during a usage of the system. The transparent plate has a lens-side surface and a wafer-side surface. The system is adapted to have a layer of lens-side fluid located between the last lens element and the lens-side surface of the transparent plate, e.g., when the last lens element is operably located over the wafer during a photolithography process. The system is also adapted to have a layer of wafer-side fluid located between the wafer-side surface of the transparent plate and the wafer, during a usage of the system. The wafer-side fluid may or may not be fluidly connected to the lens-side fluid. The wafer-side fluid may or may not differ from the lens-side fluid.
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申请公布号 |
US7180572(B2) |
申请公布日期 |
2007.02.20 |
申请号 |
US20040009505 |
申请日期 |
2004.12.10 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
SHIH JEN-CHIEH;LIN BURN-JENG;GAU TSAI-SHENG;LIU RU-GUN;CHEN CHUN-KUANG;LIN CHIN-HSIANG;TSENG HORNG-HUEI |
分类号 |
G03B27/42;G03B27/52;G03F7/20 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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