发明名称 Interconnect circuitry, multichip module, and methods for making them
摘要 Methods of electroless plating metal on a dielectric material includes dipping the dielectric in a solution containing attractive catalytic metal particles and a metal salt solution. A thicker metallic layer can be deposited on top of the resulting layer by electroplating. Electrical circuits and multichip modules including such circuits can be formed having one or more dielectric layers comprised of latex and one or more layers of conductive leads, one or more dielectric layers comprised of a flexible dielectric material, and one or more layers of electrically conductive material patterned to interconnect such ICs. Frames that hold ICs against a substrate may be employed to planarize their top surfaces against the substrate, as well as standard photolithographic techniques in creating conductive paths on the dielectric material between the ICs.
申请公布号 US7179742(B2) 申请公布日期 2007.02.20
申请号 US20040010790 申请日期 2004.12.13
申请人 CUSTOM ONE DESIGN, INC. 发明人 NUYTKENS PETER R.;POPEKO ILYA E.;KULINETS JOSEPH M.
分类号 H01L21/44;C23C18/16;H01L21/60;H01L23/538;H05K3/18 主分类号 H01L21/44
代理机构 代理人
主权项
地址