发明名称 Low Temperature Active Matrix Display Device and Fabrication Process
摘要 Provided are a low temperature active matrix display device using a plastic substrate and method of fabricating the same. The low temperature active matrix display device includes: a plastic substrate; a reflection layer disposed on the plastic substrate; a buffer layer disposed on the reflection layer; a thin film transistor disposed on the buffer layer in a first region of the plastic substrate; an interlayer dielectric layer disposed on the thin film transistor; a capacitor disposed in a trench formed in a second region of the plastic substrate and having a first electrode connected to a source electrode and a drain electrode of the thin film transistor, the trench extending from the interlayer dielectric layer to the reflection layer; and a display device having one electrode connected to a second electrode of the capacitor. The above-described structure includes photoresist spacers to decrease a leakage current from the TFT, includes a reflector to protect the plastic substrate from deformation due to laser irradiation, and employs a three-dimensional capacitor to increase an aperture ratio.
申请公布号 KR100684176(B1) 申请公布日期 2007.02.20
申请号 KR20040107026 申请日期 2004.12.16
申请人 发明人
分类号 H05B33/00;H05B33/10 主分类号 H05B33/00
代理机构 代理人
主权项
地址