发明名称 |
Capacitive element, method of manufacture of the same, and semiconductor device |
摘要 |
A capacitive element is characterized by including: a base ( 12 ); a lower barrier layer ( 13 ) formed on the base ( 12 ); capacitors (Q<SUB>1 </SUB>and Q<SUB>2</SUB>) made by forming a lower electrode ( 14 a), capacitor dielectric layers ( 15 a), and upper electrodes ( 16 a) in this order on the lower barrier layer ( 13 ); and an upper barrier layer ( 20 ) covering at least the capacitor dielectric layers ( 15 a) and the lower barrier layer ( 13 ).
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申请公布号 |
US2007034989(A1) |
申请公布日期 |
2007.02.15 |
申请号 |
US20060581383 |
申请日期 |
2006.10.17 |
申请人 |
FUJITSU LIMITED |
发明人 |
SHIOGA TAKESHI;BANIECKI JOHN D.;KURIHARA KAZUAKI |
分类号 |
H01L29/00 |
主分类号 |
H01L29/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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