发明名称 Capacitive element, method of manufacture of the same, and semiconductor device
摘要 A capacitive element is characterized by including: a base ( 12 ); a lower barrier layer ( 13 ) formed on the base ( 12 ); capacitors (Q<SUB>1 </SUB>and Q<SUB>2</SUB>) made by forming a lower electrode ( 14 a), capacitor dielectric layers ( 15 a), and upper electrodes ( 16 a) in this order on the lower barrier layer ( 13 ); and an upper barrier layer ( 20 ) covering at least the capacitor dielectric layers ( 15 a) and the lower barrier layer ( 13 ).
申请公布号 US2007034989(A1) 申请公布日期 2007.02.15
申请号 US20060581383 申请日期 2006.10.17
申请人 FUJITSU LIMITED 发明人 SHIOGA TAKESHI;BANIECKI JOHN D.;KURIHARA KAZUAKI
分类号 H01L29/00 主分类号 H01L29/00
代理机构 代理人
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