发明名称 |
Defect inspection apparatus, sensitivity calibration method for the same, substrate for defect detection sensitivity calibration, and manufacturing method thereof |
摘要 |
A reference substrate for defect detection sensitivity calibration has: patterns and programmed defective portions which are cone defects with different sizes and are formed at random on a silicon substrate. By using the reference substrate for defect detection sensitivity calibration, it is possible to obtain an index, usable in manufacturing management, for determining sensitivity adjustment after a lamp is replaced in an illumination part of a defect inspection apparatus.
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申请公布号 |
US2007035726(A1) |
申请公布日期 |
2007.02.15 |
申请号 |
US20060501755 |
申请日期 |
2006.08.10 |
申请人 |
FUJITSU LIMITED |
发明人 |
TAKAHASHI NAOHIRO;YASUMOTO TAMIHIDE |
分类号 |
G01N21/88 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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