| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material containing a PED stabilizing agent and having high sensitivity, high resolution and satisfactory PED stability and to provide a pattern forming method using the resist material. SOLUTION: The resist material contains at least one kind selected from thiol derivatives, disulfide derivatives and thiol sulfonate derivatives and may further contain a dissolution controlling agent and/or a surfactant. The pattern forming method includes a step for applying the resist material on a substrate, a step for exposing the resist material through a mask with high energy beams or electron beams after heating and a step for developing the resist material with a developing solution optionally after heating. |
