Chemical Vapor Deposition Apparatus for Multiple Substrates,申请号KR20050072195-传众专利搜索

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发明名称	Chemical Vapor Deposition Apparatus for Multiple Substrates
摘要
申请公布号	KR20070017673(A)	申请公布日期	2007.02.13
申请号	KR20050072195	申请日期	2005.08.08
申请人		发明人
分类号	H01L21/205	主分类号	H01L21/205
代理机构		代理人
主权项
地址

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