发明名称 Position determination method and lithographic apparatus
摘要 An embodiment of the invention may be applied to measure the positions of features in a alignment region on a mask with a sensor. The positions of the features in the alignment region are known from the design. A feature of which the position is measured, is identified by comparing the relative positions between measured features with relative positions known from the design. The known position of the identified feature is subtracted from a measured position of the identified feature to give the position of the mask.
申请公布号 US7177009(B2) 申请公布日期 2007.02.13
申请号 US20040954654 申请日期 2004.10.01
申请人 ASML NETHERLANDS B.V. 发明人 KLINKHAMER JACOB FREDERIK FRISO;BRUINSMA ANASTASIUS JACOBUS ANICETUS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;VAN MIERLO HUBERT ADRIAAN
分类号 G03B27/32;G03B27/42 主分类号 G03B27/32
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