| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an amorphous transparent conductive film with small visible light refractive index, small specific resistance, amorphous, hardly generating exfoliation and crack or the like caused by sliding movement and bending, having flat film face, further, not necessary to heat a substrate, which can be formed at neighborhood of room temperature. <P>SOLUTION: The amorphous transparent conductive film contains gallium, indium, zinc and oxygen, and ratio of the number of atom of gallium to that of indium is 1 or more and 1.6 or less. The amorphous transparent conductive film is obtained by a sputtering using a sintered compound target containing zinc of which ratio of the number of atom to that of indium is not less than 0.01 and not more than 0.7. <P>COPYRIGHT: (C)2007,JPO&INPIT |
