发明名称 |
Crystallization apparatus, crystallization method, and phase shift mask |
摘要 |
A phase shift mask is arranged before a laser device through a beam expander, a homogenizer and a mirror, and a processed substrate is set on an opposed surface of the phase shift mask with an image forming optical system therebetween. The processed substrate is held at a predetermined position by using a substrate chuck such as a vacuum chuck or an electrostatic chuck.
|
申请公布号 |
US7172841(B2) |
申请公布日期 |
2007.02.06 |
申请号 |
US20030734248 |
申请日期 |
2003.12.15 |
申请人 |
ADVANCED LCD TECHNOLOGIES DEVELOPMENT CENTER CO.,LTD. |
发明人 |
TANIGUCHI YUKIO;MATSUMURA MASAKIYO;KIMURA YOSHINOBU |
分类号 |
G03F1/00;B23K26/06;H01L21/20 |
主分类号 |
G03F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|