| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface-processing method and a surface-processing device, capable of easily forming a rough surface on a substrate surface or thin film where the size and distribution are controlled in detail. SOLUTION: The surface processing method includes a process for spraying fine particles on an object to be processed, and a process for plasma-processing the object with the fine particles as a mask. COPYRIGHT: (C)2007,JPO&INPIT
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