| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a hologram element capable of obtaining a high primary diffraction efficiency in each area and obtaining an almost fixed value as primary diffraction efficiency in each area even though grating intervals of diffraction grating of hologram patterns formed in a plurality of respective areas are different. <P>SOLUTION: After forming a photosensitive material film 44 on the surface of a transparent substrate 41, the first hologram pattern 42 of the first area and the second hologram pattern 43 of the second area with different grating intervals are respectively developed as mask patterns 44a and 44b by a suitable exposure amount corresponding to the grating interval of each area. Thereafter, etching is applied to form the first hologram pattern 42 and the second hologram pattern 43, thereby being able to form a diffraction grating, as a diffraction grating of a hologram pattern of each area, wherein a duty ratio being a ratio of the width of a protruding part to the grating interval is suitable and the values of duty ratios between the respective areas are almost equal. <P>COPYRIGHT: (C)2007,JPO&INPIT |
