发明名称 |
Vaporizing material at a uniform rate |
摘要 |
A method of vaporizing material at a uniform rate for forming a layer on a substrate includes feeding a column of vaporizable material from a temperature controlled region maintained below the vaporizable material's effective vaporization temperature to a source of vaporization energy, wherein the volume of the column can vary during vaporization; and providing a source of vaporization energy delivering a constant heat flux to the surface of the column so that a uniform volume per unit time of the vaporizable material is vaporized to form the layer on the substrate, irrespective of the feeding rate.
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申请公布号 |
US2007026146(A1) |
申请公布日期 |
2007.02.01 |
申请号 |
US20050190653 |
申请日期 |
2005.07.27 |
申请人 |
EASTMAN KODAK COMPANY |
发明人 |
LONG MICHAEL;KOPPE BRUCE E. |
分类号 |
C23C16/00;H05B3/00;H05B6/02;H05B6/24 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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