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发明名称
Method of manufacturing semiconductor device used Atomic Layer DepositionALD
摘要
申请公布号
KR100676201(B1)
申请公布日期
2007.01.30
申请号
KR20050043476
申请日期
2005.05.24
申请人
发明人
分类号
H01L21/205
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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