发明名称 Dual gate electrode metal oxide semciconductor transistors
摘要 A semiconductor product includes a pair of field effect transistor device structures formed one each within a pair of doped well regions within a semiconductor substrate. The pair of field effect transistor device structures is formed with a pair of metal gate electrodes formed employing different laminated metal constructions. By correlating a work function within a metal layer within a gate electrode with a work function of a semiconductor substrate region over which it is formed, the field effect transistor devices are formed with enhanced performance.
申请公布号 US2007018259(A1) 申请公布日期 2007.01.25
申请号 US20050187271 申请日期 2005.07.21
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 KO CHIH-HSIN;YEO YEE-CHIA;LEE WEN-CHIN
分类号 H01L29/94 主分类号 H01L29/94
代理机构 代理人
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