发明名称 |
Dual gate electrode metal oxide semciconductor transistors |
摘要 |
A semiconductor product includes a pair of field effect transistor device structures formed one each within a pair of doped well regions within a semiconductor substrate. The pair of field effect transistor device structures is formed with a pair of metal gate electrodes formed employing different laminated metal constructions. By correlating a work function within a metal layer within a gate electrode with a work function of a semiconductor substrate region over which it is formed, the field effect transistor devices are formed with enhanced performance.
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申请公布号 |
US2007018259(A1) |
申请公布日期 |
2007.01.25 |
申请号 |
US20050187271 |
申请日期 |
2005.07.21 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
KO CHIH-HSIN;YEO YEE-CHIA;LEE WEN-CHIN |
分类号 |
H01L29/94 |
主分类号 |
H01L29/94 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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