SUBSTRATE HANDLER, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a substrate handler, a lithographic apparatus, and a device manufacturing method.

SOLUTION: The substrate handler for handling a substrate comprises a conditioning device for conditioning the substrate. The substrate handler is provided with a displacing device configured so as to displace the substrate in the direction substantially parallel to a support surface. The displacing device is configured so as to displace the substrate during the conditioning process from one conditioning position to one or more other conditioning positions. The substrate handler comprises a float device configured to provide an air bed above a support surface of the substrate handler. The substrate handler is configured so as to hold the substrate on an air bed during the conditioning of the substrate.

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