发明名称 Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method
摘要 The present invention provides a variable slit apparatus, which can rapidly change the shape of the slit width of the illumination light while finely controlling the shape of the slit-shaped illumination light, an illumination apparatus that uses such, an exposure apparatus, and the like. The variable slit apparatus for forming a slit-shaped illumination light comprises: a first light-shielding mechanism that comprises a plurality of blades for defining one long side of the illumination light; a second light-mechanism configured to define another long side of the illumination light; and a drive mechanism that changes the width of the illumination light in the latitudinal direction orthogonal to the longitudinal direction by driving the first light-shielding mechanism and the second light-shielding mechanism.
申请公布号 US2007014112(A1) 申请公布日期 2007.01.18
申请号 US20060430917 申请日期 2006.05.10
申请人 NIKON CORPORATION 发明人 OHYA EIZO;NAKAMURA KYOJI;MIZUNO YASUSHI
分类号 F21S8/00;G03F7/20;H01L21/027 主分类号 F21S8/00
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