发明名称 |
Variable slit apparatus, illumination apparatus, exposure apparatus, exposure method, and device fabrication method |
摘要 |
The present invention provides a variable slit apparatus, which can rapidly change the shape of the slit width of the illumination light while finely controlling the shape of the slit-shaped illumination light, an illumination apparatus that uses such, an exposure apparatus, and the like. The variable slit apparatus for forming a slit-shaped illumination light comprises: a first light-shielding mechanism that comprises a plurality of blades for defining one long side of the illumination light; a second light-mechanism configured to define another long side of the illumination light; and a drive mechanism that changes the width of the illumination light in the latitudinal direction orthogonal to the longitudinal direction by driving the first light-shielding mechanism and the second light-shielding mechanism.
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申请公布号 |
US2007014112(A1) |
申请公布日期 |
2007.01.18 |
申请号 |
US20060430917 |
申请日期 |
2006.05.10 |
申请人 |
NIKON CORPORATION |
发明人 |
OHYA EIZO;NAKAMURA KYOJI;MIZUNO YASUSHI |
分类号 |
F21S8/00;G03F7/20;H01L21/027 |
主分类号 |
F21S8/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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