发明名称 METHOD OF MANUFACTURING OPTICAL CONDUCTIVE LAYER
摘要 <P>PROBLEM TO BE SOLVED: To provide a manufacturing method capable of easily controlling the film thickness of a sintered body of Bi<SB>12</SB>MO<SB>20</SB>(where M is at least one kind selected from among Ge, Si and Ti) forming a radiation imaging panel for recording radiograph information as an electrostatic latent image. <P>SOLUTION: Ball mill blending of bismuth oxide and titanium oxide is executed in ethanol. The product is temporarily baked to obtain a powder of Bi<SB>12</SB>MO<SB>20</SB>. The powder is subjected to single-axis press molding at 42 MPa to manufacture a Bi<SB>12</SB>MO<SB>20</SB>sintered film in Ar flow, and the film is positioned to set the thickness thereof at 30-600 &mu;m. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007012841(A) 申请公布日期 2007.01.18
申请号 JP20050191169 申请日期 2005.06.30
申请人 FUJIFILM HOLDINGS CORP 发明人 KAKIUCHI RYOZO
分类号 H01L31/0264;G01T1/24;H01L27/14;H01L31/09;H04N5/32 主分类号 H01L31/0264
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