| 摘要 |
<p>A wafer edge exposure apparatus is provided to precisely adjust a height of a light source by using an adjusting device, thereby reducing a defective of a product and improving productivity. A wafer edge exposure apparatus includes a wafer chuck on which a wafer is seated, a light source spaced apart from the wafer for radiating a light of a certain wavelength to the wafer, and an adjusting device adjusting a height of the light source. The adjusting device has a body(142) supporting the light source, a stepping motor(143) mounted in the body and having a rotation shaft(145), a helical gear(147) connected to one end of the rotation shaft, a transfer gear(149) meshed with the helical gear, and a transfer guide(148) coupled to the transfer gear.</p> |
