| 摘要 |
Methods and systems are described for improving optical lithographic processing of a substrate (114) by selecting appropriate system parameters in order to obtain a good image or print of the pattern to be obtained in the resist layer (112). The method is based on selecting a set of system parameters for an optical lithographic system (100) having selectable system parameters, thus characterising the optical lithographic system (100), and obtaining transferred lens pupil information. The latter is performed by obtaining, for each point of a set of points within a lens pupil of the optical lithographic system (100) with the selected set of system parameters, a value of at least one optical parameter at the level of the substrate (114), the at least one optical parameter being a property of a light ray projected towards the substrate (114) from said point of the set of points within the lens pupil. The lens pupil information then is combined with information about the mask (106) to be used for generating the pattern in the resist layer (112). This combined information allows evaluating or ranking the optical lithographic system (100), defined by its set of system parameters, for the lithographic processing to be performed. |
