| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new polyester compound having an aliphatic ring structure in its polymer main chain, together having high resistance to etching, high solvent solubility, and high adhesion to a base plate, to provide a resist material given by using the same, and to provide a method for forming a pattern. <P>SOLUTION: This new main chain ring-type polyester compound is derived from polycondensation reaction of a diol compound with bicyco[2.2.2]octane-2,3:5,6-tetracarboxylic acid anhydride. Further, the resist material which is given by using the main chain ring-type polyester compound and the method for forming the fine pattern which comprises using the same are provided, respectively. <P>COPYRIGHT: (C)2007,JPO&INPIT |
