发明名称 |
Seal ring arrangements for immersion lithography systems |
摘要 |
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.
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申请公布号 |
US2007008508(A1) |
申请公布日期 |
2007.01.11 |
申请号 |
US20060522611 |
申请日期 |
2006.09.18 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN BURN J.;GAU TSAI-SHENG;CHEN CHUN-KUANG;LIU RU-GUN;YU SHINN S.;SHIH JEN C. |
分类号 |
G03B27/42 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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