| 发明名称 |
SYSTEM AND METHOD FOR CRITICAL DIMENSION REDUCTION AND PITCH REDUCTION |
| 摘要 |
<p>A method of forming a feature includes forming a mask of a first material on an underlying layer, the mask having an incorrect profile. The profile of the mask is corrected and a feature is formed in the underlying layer. A system for forming a feature is also disclosed.</p> |
| 申请公布号 |
WO2007005204(A2) |
申请公布日期 |
2007.01.11 |
| 申请号 |
WO2006US22890 |
申请日期 |
2006.06.12 |
| 申请人 |
LAM RESEARCH CORPORATION;CHARATAN, ROBERT |
发明人 |
CHARATAN, ROBERT |
| 分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
