| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor and a substrate processing method, capable of preventing chemical from staying in a reception member for receiving chemical which disperses from a substrate. SOLUTION: Cleaning liquid nozzles 4 which inject cleaning liquid in a spray shape from injection ports are disposed on sides of a spin base 5 of a spin chuck 1. The cleaning liquid nozzles 4 are fitted while the injection ports face an outer part in a horizontal direction so that cleaning liquid is supplied to a region to which chemical adheres in an inner face 20 of a cylindrical side wall 19 of a guard 14. Discharge of cleaning liquid from the cleaning liquid nozzles 4 is started prior to supply start of chemical to a wafer W. Discharge of cleaning liquid from the cleaning liquid nozzles 4 is continued while chemical is supplied to the wafer W, and discharge of cleaning liquid from the cleaning liquid nozzles 4 is stopped after supply of chemical is stopped. COPYRIGHT: (C)2007,JPO&INPIT
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