| 摘要 |
PROBLEM TO BE SOLVED: To correctly measure a size of a pattern which shrinks by irradiation of an electron beam by suppressing the shrink in measuring the pattern. SOLUTION: Based on combinations of magnifications stored in a memory device which stores a plurality of combinations of X-direction measuring magnifications and Y-direction magnifications lower than the X-direction magnifications, the electron beam is deflected in a rectangle having a short side in the X-direction and a long side in the Y-direction, the pattern is displayed so that the shape of the pattern in the Y-direction gets narrower with respect to the X-direction, and a size of the pattern in the X-direction is measured based on a pattern image displayed on a display region. COPYRIGHT: (C)2007,JPO&INPIT
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