发明名称 METHOD OF ROUGHENING NITRIDE CRYSTAL AND METHOD OF FABRICATION NITRIDE LIGHT EMITTING DIODE USING THE SAME
摘要 A method for processing a rough surface of a nitride single crystal is provided to improve surface roughness and change the shape of an etching pit by adding aluminum to a mixture solution of H2PSO4 and H3PO4 as etchant used in a nitride crystal. Etchant in which H2PSO4, H3PO4 and aluminum are mixed is prepared. A roughening treatment is performed by applying the etchant to the surface of a nitride single crystal. In the mixture solution, H2PSO4 and H3PO4 are mixed in a ratio of 1:10 and the content of the aluminum is not less than around 0.1 mole/liter.
申请公布号 KR20070006224(A) 申请公布日期 2007.01.11
申请号 KR20050061360 申请日期 2005.07.07
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 ALEXANDER FOMIN;LEE, KYU HAN;KIM, JE WON
分类号 H01L33/22 主分类号 H01L33/22
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