发明名称 |
METHOD OF ROUGHENING NITRIDE CRYSTAL AND METHOD OF FABRICATION NITRIDE LIGHT EMITTING DIODE USING THE SAME |
摘要 |
A method for processing a rough surface of a nitride single crystal is provided to improve surface roughness and change the shape of an etching pit by adding aluminum to a mixture solution of H2PSO4 and H3PO4 as etchant used in a nitride crystal. Etchant in which H2PSO4, H3PO4 and aluminum are mixed is prepared. A roughening treatment is performed by applying the etchant to the surface of a nitride single crystal. In the mixture solution, H2PSO4 and H3PO4 are mixed in a ratio of 1:10 and the content of the aluminum is not less than around 0.1 mole/liter.
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申请公布号 |
KR20070006224(A) |
申请公布日期 |
2007.01.11 |
申请号 |
KR20050061360 |
申请日期 |
2005.07.07 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
ALEXANDER FOMIN;LEE, KYU HAN;KIM, JE WON |
分类号 |
H01L33/22 |
主分类号 |
H01L33/22 |
代理机构 |
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主权项 |
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地址 |
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