| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic apparatus that can accurately position a substrate upon exposure even when the substrate size increases. <P>SOLUTION: A lithographic apparatus is provided which has an array of individually controllable elements to modulate a cross-section of a radiation beam, a substrate table to support a substrate, a projection system to project the modulated radiation beam onto a target portion of the substrate to apply a pattern, and a position encoder having a position sensor and a scale to determine a position of the substrate table. The pattern comprises a first line and a second line, the first line being offset from the second line. The scale comprises a plurality of lines intended to be straight and parallel to one another. The lithographic apparatus further includes: an imaging device to obtain an image of the first and second lines; and an image process unit to determine the non-uniformity of at least a part of the scale based on separation distances between the first and second lines measured at a plurality of positions. <P>COPYRIGHT: (C)2007,JPO&INPIT |
