| 摘要 |
A method for manufacturing an array substrate is provided to be capable of manufacturing the array substrate with three masks, by simultaneously forming a gate electrode and an active layer and forming a pixel electrode through back exposure using a thin film transistor, a data line, and a data line. A gate electrode(141) and an active layer(170) are simultaneously formed on a transparent substrate through a first mask. Source and drain electrodes(142,143) are formed on the resultant substrate through a second mask. A passivation layer(160) is formed through a third mask, wherein the passivation layer has a contact hole(165) exposing the drain electrode. A pixel electrode(150), which is electrically connected to the drain electrode through the contact hole, is formed by the gate electrode, the source electrode, and the drain electrode as a mask. |
