发明名称 Semiconductor device advantageous in improving water resistance and oxidation resistance
摘要 A semiconductor device includes a guard ring formed in an inter-level insulating film on a semiconductor substrate to surround an element forming region on the semiconductor substrate and containing Cu as a main component. And the device further includes a first barrier film formed on an interface between the inter-level insulating film and the guard ring and containing a compound of a preset metal element and a constituent element of the inter-level insulating film as a main component.
申请公布号 US2007001307(A1) 申请公布日期 2007.01.04
申请号 US20060440453 申请日期 2006.05.25
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 USUI TAKAMASA;NASU HAYATO;SHIBATA HIDEKI
分类号 H01L23/52 主分类号 H01L23/52
代理机构 代理人
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