发明名称 |
Semiconductor device advantageous in improving water resistance and oxidation resistance |
摘要 |
A semiconductor device includes a guard ring formed in an inter-level insulating film on a semiconductor substrate to surround an element forming region on the semiconductor substrate and containing Cu as a main component. And the device further includes a first barrier film formed on an interface between the inter-level insulating film and the guard ring and containing a compound of a preset metal element and a constituent element of the inter-level insulating film as a main component.
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申请公布号 |
US2007001307(A1) |
申请公布日期 |
2007.01.04 |
申请号 |
US20060440453 |
申请日期 |
2006.05.25 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
USUI TAKAMASA;NASU HAYATO;SHIBATA HIDEKI |
分类号 |
H01L23/52 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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