发明名称 |
Semiconductor memory element, semiconductor memory arrangement, method for fabricating a semiconductor memory element and method for operating a semiconductor memory element |
摘要 |
A semiconductor memory element has a substrate, in which a source region and a drain region are formed, a floating gate electrically insulated from the substrate, and a tunnel barrier arrangement, via which charging or discharging of the floating gate can be performed. It is possible to alter the conductivity of a channel between source and drain regions by charging or discharging the floating gate. A source line is electrically conductively connected to the source region and controls the charge transmission of the tunnel barrier arrangement.
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申请公布号 |
US7157767(B2) |
申请公布日期 |
2007.01.02 |
申请号 |
US20040486184 |
申请日期 |
2004.10.25 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
SPECHT MICHAEL;HOFMANN FRANZ |
分类号 |
H01L29/788;G11C16/04;H01L21/28;H01L21/336;H01L21/8247;H01L27/115;H01L29/51;H01L29/792 |
主分类号 |
H01L29/788 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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