发明名称 Semiconductor memory element, semiconductor memory arrangement, method for fabricating a semiconductor memory element and method for operating a semiconductor memory element
摘要 A semiconductor memory element has a substrate, in which a source region and a drain region are formed, a floating gate electrically insulated from the substrate, and a tunnel barrier arrangement, via which charging or discharging of the floating gate can be performed. It is possible to alter the conductivity of a channel between source and drain regions by charging or discharging the floating gate. A source line is electrically conductively connected to the source region and controls the charge transmission of the tunnel barrier arrangement.
申请公布号 US7157767(B2) 申请公布日期 2007.01.02
申请号 US20040486184 申请日期 2004.10.25
申请人 INFINEON TECHNOLOGIES AG 发明人 SPECHT MICHAEL;HOFMANN FRANZ
分类号 H01L29/788;G11C16/04;H01L21/28;H01L21/336;H01L21/8247;H01L27/115;H01L29/51;H01L29/792 主分类号 H01L29/788
代理机构 代理人
主权项
地址
您可能感兴趣的专利